Continued scaling of integrated circuits to smaller dimensions is still a viable way to increase compute power, achieve higher memory cell density, or reduce power consumption. These days, chip makers ...
Schematic image of the basic steps for creating ordered silicon nanostructures through a mask of polystyrene nanospheres using the nanosphere lithography process ...
2019 marked an important milestone for extreme ultraviolet (EUV) lithography. In that year, the EUV patterning technology was for the first time deployed for the mass production of logic chips of the ...
Lithography, based on conventional ink-printing processes, is a technique for patterning a variety of layers, such as conductors, semiconductors, or dielectrics, on a surface. Nanopatterning stretches ...
LEUVEN, Belgium — This week, at SPIE 2023 Advanced Lithography + Patterning Conference, in San Jose, CA, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, ...
At the forefront of Europe’s photonics innovation, TNO is building a state-of-the-art pilot line for Indium Phosphide (InP) photonic chips at the High Tech Campus in Eindhoven. As part of the ...
Self-aligned lithographic process techniques are playing an increasingly important role in advanced technology nodes. Even with the growing use of extreme ultraviolet (EUV) lithography, ...
Electron beam (e-beam) lithography is a specialized technique for creating the extremely fine patterns required by the modern electronics industry for integrated circuits. These patterns are much ...
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